Atmospheric plasma deposition of Crystalline inorganic coatings

Université Libre de Bruxelles - Réseau LIEU - 06/03/2020


The invention aims at providing a new and improved DBD plasma reactor for performing PECVD of a crystalline inorganic coating on a substrate. Thanks to an original coupling of a substrate heating device based on an inductive current loop and located under the electrode and an atmospheric pressure dielectric barrier discharge, we show that one can deposit in one step crystalline vanadium oxide and titanium oxide, with grain sizes bigger than those achieved by post-deposition annealing in less time. This original setup avoids electrical interferences with the high frequency plasma circuit, and allows fast heating of the substrate, located on top of a dielectric.


- Environmental friendly - Allows to deposit coatings with unique properties - Better control of the heating - Avoids costly post-treatment annealing - Energy efficient These crystalline inorganic deposits are of paramount importance for the field of semiconductors and therefore of current microelectronics. These deposits are central to the operation of a large number of microelectronic systems and the invention contributes to reduce the production costs of these components, since it allows crystalline deposits to be brought into the field of deposits by atmospheric plasma and more precisely those produced by DBD. Vanadium oxides can be used for infrared sensors, as catalysts, as thermo chromic or electro chromic devices and as cathode for Li-ion batteries. Titanium oxide is well known as photocatalyst, where it has been shown that, in most conditions, the anatases are the most active ones.


The invention of an induction heating system adapted to a reactor of the 'dielectricbarrier discharge' type known as DBD, opened up the field of crystalline deposits of inorganic material hitherto limited to deposition under vacuum or at very high temperature.

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